Spectroscopic ellipsometry is a non-destructive, noncontact, and non-invasive optical technique which is based on the change in the polarization state of light as it is reflected obliquely from a thin film sample. Ellipsometry uses a modelbased approach to determine thin film, interface, and surface roughness thicknesses, as well as optical properties (and much more!) for thin films ranging in thickness from a few A to several tens of microns. Also, spectroscopic ellipsometry can be performed either ex-situ or in-situ, in static or kinetic mode, for various application needs.

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