Spin coater is routinely used in the clean room to coat thin layer of liquid photosensitive polymer called photoresist. After a drop of photoresis is added to wafer surface, the sample spins at high angular speed and form thin layer measured in micrometers. The layer thickness is controlled using rotation rate, such as in the range 1-10k rmp. Contact me if you need to coat wafers or concerning related clean room equipment.
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